SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Optical Microlithography XX - The causes of horizontal-vertical (H-V) bias in optical lithography: dipole source errors
Biafore, John J., Flagello, Donis G., Mack, Chris A., Robertson, Stewart A., Smith, Mark D., Kapasi, SanjayVolume:
6520
Year:
2007
Language:
english
DOI:
10.1117/12.712864
File:
PDF, 335 KB
english, 2007