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SPIE Proceedings [SPIE 27th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 17 September 2007)] Photomask Technology 2007 - Mask calibration dominated methodology for OPC matching
Zhu, Liang, Naber, Robert J., Kawahira, Hiroichi, Lu, Mark, King, Dion, Gu, Yili, Yang, Steve, Melvin III, Lawrence S.Volume:
6730
Year:
2007
Language:
english
DOI:
10.1117/12.742173
File:
PDF, 1.21 MB
english, 2007