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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Optical Microlithography XXI - Pattern centric OPC flow: a special RET flow with fast turn-around-time
Wang, Tom, Wu, Joanne, Liu, Qingwei, Zhang, Gary, Wang, Benny, Su, Bo, Cheng, GuojieVolume:
6924
Year:
2008
Language:
english
DOI:
10.1117/12.771617
File:
PDF, 1.68 MB
english, 2008