SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Emerging Lithographic Technologies XII - Performance and lifetime of EUV source collectors measured with a full size EUV collector reflectometer
Hinze, Ulf, Schellenberg, Frank M., Chichkov, Boris N., Feigl, Torsten, Zeitner, Uwe D., Damm, Christoph, Bolshukhin, Denis, Kleinschmidt, Jürgen, Schriever, Guido, Schürmann, Max-ChristianVolume:
6921
Year:
2008
Language:
english
DOI:
10.1117/12.772486
File:
PDF, 764 KB
english, 2008