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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Optical Microlithography XXI - OPC optimization for double dipole lithography and its application on 45nm node with dry exposure
Park, Se-Jin, Seo, Jae-Kyung, Li, ChengHe, Liu, Daisy, An, Petros, Kang, Xiao-Hui, Guo, EricVolume:
6924
Year:
2008
Language:
english
DOI:
10.1117/12.773290
File:
PDF, 664 KB
english, 2008