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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Optical Microlithography XXI - Novel method for optimizing lithography exposure conditions using full-chip post-OPC simulation
Sturtevant, John, Jayaram, Srividya, Hong, Le, Drozdov, AlexandreVolume:
6924
Year:
2008
Language:
english
DOI:
10.1117/12.773335
File:
PDF, 815 KB
english, 2008