SPIE Proceedings [SPIE Photomask and NGL Mask Technology XV - Yokohama, Japan (Wednesday 16 April 2008)] Photomask and Next-Generation Lithography Mask Technology XV - AF fixer: new incremental OPC method for optimizing assist feature
Jung, Sung-Gon, Horiuchi, Toshiyuki, Kim, Sang-Wook, Suh, Sung-Soo, Kim, Young-Chang, Lee, Suk-Joo, Choi, Sung-Woon, Han, Woo-Sung, Moon, Joo-Tae, Barnes, Levi D., Li, Xiaohai, Lugg, Robert M., Lee, SVolume:
7028
Year:
2008
Language:
english
DOI:
10.1117/12.793040
File:
PDF, 394 KB
english, 2008