SPIE Proceedings [SPIE Photomask and NGL Mask Technology XV - Yokohama, Japan (Wednesday 16 April 2008)] Photomask and Next-Generation Lithography Mask Technology XV - Tool-induced hotspot fixing flow for high volume products
Mashita, Hiromitsu, Horiuchi, Toshiyuki, Kotani, Toshiya, Nakajima, Fumiharu, Mukai, Hidefumi, Sato, Kazuya, Tanaka, Satoshi, Hashimoto, Kohji, Inoue, SoichiVolume:
7028
Year:
2008
Language:
english
DOI:
10.1117/12.793125
File:
PDF, 1.20 MB
english, 2008