SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 6 October 2008)] Photomask Technology 2008 - Challenges for the quality control of assist features for 45nm node technology and beyond
Wang, Lin, Kawahira, Hiroichi, Zurbrick, Larry S., Lukanc, Todd, Takahashi, Makoto, Kim, Hung-Eil, Phan, Khoi, Yamazaki, Taichi, Kojima, Yosuke, Nozaki, Wataru, Haraguchi, Takashi, Okuda, YoshimitsuVolume:
7122
Year:
2008
Language:
english
DOI:
10.1117/12.800916
File:
PDF, 554 KB
english, 2008