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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Advances in Resist Materials and Processing Technology XXVI - Development of novel UV cross-linkable materials for enhancing planarity in via applications via the correlation of simulated and experimental analyses
Takei, Satoshi, Henderson, Clifford L., Lin, Michael W., Yoon, Sangwoong, Ohashi, Tomoya, Nakajima, Yasuyuki, Willson, C. GrantVolume:
7273
Year:
2009
Language:
english
DOI:
10.1117/12.813530
File:
PDF, 544 KB
english, 2009