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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Alternative Lithographic Technologies - Assessment of full-chip level EUV optical correction for sub-40nm memory device
Lee, Jeonghoon, Schellenberg, Frank M., La Fontaine, Bruno M., Kim, Insung, Goo, Doohoon, Park, Joo-on, Park, Changmin, Park, Jinhong, Yeo, Jeongho, Choi, Seongwoon, Han, WoosungVolume:
7271
Year:
2009
Language:
english
DOI:
10.1117/12.813996
File:
PDF, 610 KB
english, 2009