SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Alternative Lithographic Technologies - EUVL reticle defectivity evaluation
Tchikoulaeva, A., Schellenberg, Frank M., La Fontaine, Bruno M., Okoroanyanwu, U., Wood, O., La Fontaine, B., Holfeld, C., Kini, S., Peikert, M., Boye, C., Koay, C.-S., Petrillo, K., Mizuno, H.Volume:
7271
Year:
2009
Language:
english
DOI:
10.1117/12.815525
File:
PDF, 681 KB
english, 2009