SPIE Proceedings [SPIE 25th European Mask and Lithography Conference - Dresden, Germany (Monday 12 January 2009)] 25th European Mask and Lithography Conference - Resolution capability of EBM-6000 and EBM-7000 for nano-imprint template
Yoshitake, S., Behringer, Uwe F. W., Kamikubo, T.Volume:
7470
Year:
2009
Language:
english
DOI:
10.1117/12.835179
File:
PDF, 784 KB
english, 2009