SPIE Proceedings [SPIE SPIE Lithography Asia - Taipei, Taiwan (Wednesday 18 November 2009)] Lithography Asia 2009 - Latest results from the Nikon NSR-S620 double patterning immersion scanner
Hirano, Kazuhiro, Chen, Alek C., Han, Woo-Sung, Shibazaki, Yuichi, Hamatani, Masato, Lin, Burn J., Yen, Anthony, Ishikawa, Jun, Iriuchijima, YasuhiroVolume:
7520
Year:
2009
Language:
english
DOI:
10.1117/12.837037
File:
PDF, 2.65 MB
english, 2009