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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Advances in Resist Materials and Processing Technology XXVII - Study on approaches for improvement of EUV-resist sensitivity
Tarutani, Shinji, Allen, Robert D., Tsubaki, Hideaki, Takahashi, Hidenori, Itou, TakayukiVolume:
7639
Year:
2010
Language:
english
DOI:
10.1117/12.846031
File:
PDF, 833 KB
english, 2010