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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Advances in Resist Materials and Processing Technology XXVII - Non-chemically amplified resists for 193-nm immersion lithography: influence of absorbance on performance
Chen, Lan, Allen, Robert D., Goh, Yong-Keng, Lawrie, Kirsten, Smith, Bruce, Montgomery, Warren, Zimmerman, Paul A., Blakey, Idriss, Whittaker, Andrew K.Volume:
7639
Year:
2010
Language:
english
DOI:
10.1117/12.846971
File:
PDF, 1.87 MB
english, 2010