SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Optical Microlithography XXIII - Study for lithography techniques of hybrid mask shape of contact hole with 1.35NA polarized illumination for 28nm-node and below logic LSI
Setta, Yuji, Dusa, Mircea V., Conley, Will, Kobayashi, Katsuyoshi, Chijimatsu, Tatsuo, Asai, SatoruVolume:
7640
Year:
2010
Language:
english
DOI:
10.1117/12.848316
File:
PDF, 7.01 MB
english, 2010