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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Advances in Resist Materials and Processing Technology XXVII - Environmentally friendly processing of photoresists in scCO 2 and decamethyltetrasiloxane
Ouyang, Christine Y., Allen, Robert D., Lee, Jin-Kyun, Sha, Jing, Ober, Christopher K.Volume:
7639
Year:
2010
Language:
english
DOI:
10.1117/12.848336
File:
PDF, 1.85 MB
english, 2010