SPIE Proceedings [SPIE Photomask and NGL Mask Technology XVII - Yokohama, Japan (Tuesday 13 April 2010)] Photomask and Next-Generation Lithography Mask Technology XVII - FIB-CVD technology for EUV mask repair
Amano, Tsuyoshi, Hosono, Kunihiro, Takagi, Noriaki, Shigemura, Hiroyuki, Terasawa, Tsuneo, Suga, Osamu, Shiina, Kensuke, Aramaki, Fumio, Kozakai, Tomokazu, Matsuda, Osamu, Yasaka, AntoVolume:
7748
Year:
2010
Language:
english
DOI:
10.1117/12.867233
File:
PDF, 659 KB
english, 2010