SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 19 September 2011)] Photomask Technology 2011 - Mask replication using jet and flash imprint lithography
Selinidis, Kosta S., Maurer, Wilhelm, Abboud, Frank E., Jones, Chris, Doyle, Gary F., Brown, Laura, Imhof, Joseph, LaBrake, Dwayne L., Resnick, Douglas J., Sreenivasan, S. V.Volume:
8166
Year:
2011
Language:
english
DOI:
10.1117/12.898865
File:
PDF, 6.16 MB
english, 2011