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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Advanced Etch Technology for Nanopatterning - Photoresist strip challenges for advanced lithography at 20nm technology node and beyond
Berry III, Ivan L., Waldfried, Carlo, Roh, Dwight, Luo, Shijian, Mattson, David, DeLuca, James, Escorcia, Orlando, Zhang, YingVolume:
8328
Year:
2012
Language:
english
DOI:
10.1117/12.918054
File:
PDF, 2.55 MB
english, 2012