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SPIE Proceedings [SPIE 1985 Microlithography Conferences - Santa Clara (Monday 11 March 1985)] Advances in Resist Technology and Processing II - Linewidth Control In Optical Projection Printing: Influence Of Resist Parameters
Arden, Wolfgang, Mader, Leonhard, Thompson, Larry F.Volume:
539
Year:
1985
Language:
english
DOI:
10.1117/12.947836
File:
PDF, 2.33 MB
english, 1985