SPIE Proceedings [SPIE Photomask and NGL Mask Technology XIX - Yokohama, Japan (Tuesday 17 April 2012)] Photomask and Next-Generation Lithography Mask Technology XIX - Development of standalone coherent EUV scatterometry microscope with high-harmonic-generation EUV source
Harada, Tetsuo, Nakasuji, Masato, Watanabe, Takeo, Nagata, Yutaka, Kinoshita, Hiroo, Kato, KokoroVolume:
8441
Year:
2012
Language:
english
DOI:
10.1117/12.952477
File:
PDF, 12.35 MB
english, 2012