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SPIE Proceedings [SPIE 1989 Microlithography Conferences - San Jose, CA (Monday 27 February 1989)] Advances in Resist Technology and Processing VI - Sub-half-micron Patterning Characteristics of Silicone-based Positive (SPP) and Negative (SNP) Resists in KrF Excimer Laser Lithography
Kawai, Yoshio, Tanaka, Akinobu, Ozaki, Yoshiharu, Takamoto, Kiichi, Yoshikawa, Akira, Reichmanis, ElsaVolume:
1086
Year:
1989
Language:
english
DOI:
10.1117/12.953029
File:
PDF, 3.65 MB
english, 1989