Optimum Condition of Anisotropic Plasma Etching for...

Optimum Condition of Anisotropic Plasma Etching for Improving Bending Properties of Ionic Polymer-Metal Composites

Choi, N.-J., Lee, H.-K., Jung, S., Park, K.-H.
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Volume:
10
Language:
english
Journal:
Journal of Nanoscience and Nanotechnology
DOI:
10.1166/jnn.2010.2240
Date:
May, 2010
File:
PDF, 2.92 MB
english, 2010
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