Investigation of the Flatband Voltage (VFB) Shift of Al2O3...

Journal of Nanoscience and Nanotechnology 2013 / 09 Vol. 13; Iss. 9

Investigation of the Flatband Voltage (VFB) Shift of Al2O3 on N2 Plasma Treated Si Substrate

Kim, Hyungchul, Lee, Jaesang, Jeon, Heeyoung, Park, Jingyu, Jeon, Hyeongtag
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Volume:
13
Language:
english
Journal:
Journal of Nanoscience and Nanotechnology
DOI:
10.1166/jnn.2013.7707
Date:
September, 2013
File:
PDF, 4.16 MB
english, 2013
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