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SPIE Proceedings [SPIE Micro - DL Tentative - San Jose, CA (Sunday 1 March 1992)] Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II - Design of synchrotron x-ray lithography beamlines
Oberschmidt, James M., Rippstein, Robert P., Ruckel, Raymond R., Chen, Alek C., Granlund, John C., Palumbo, Alfred E., Peckerar, Martin C.Volume:
1671
Year:
1992
Language:
english
DOI:
10.1117/12.136017
File:
PDF, 380 KB
english, 1992