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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Advances in Resist Materials and Processing Technology XXX - Underlayer and rinse materials for improving EUV resist performance
Padmanaban, Munirathna, Cho, JoonYeon, Kudo, Takanori, Mullen, Salem, Yao, Huirong, Noya, Go, Matsuura, Yuriko, Ide, Yasuaki, Li, Jin, Pawlowski, Georg, Somervell, Mark H.Volume:
8682
Year:
2013
Language:
english
DOI:
10.1117/12.2013363
File:
PDF, 4.00 MB
english, 2013