SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 10 September 2013)] Photomask Technology 2013 - AF printability check with a full-chip 3D resist profile model
Wu, Cheng-En R., Chang, Jason, Song, Hua, Shiely, James, Faure, Thomas B., Ackmann, Paul W.Volume:
8880
Year:
2013
Language:
english
DOI:
10.1117/12.2027843
File:
PDF, 927 KB
english, 2013