SPIE Proceedings [SPIE SPIE Photomask Technology -...

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SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California, United States (Tuesday 10 September 2013)] Photomask Technology 2013 - AF printability check with a full-chip 3D resist profile model

Wu, Cheng-En R., Chang, Jason, Song, Hua, Shiely, James, Faure, Thomas B., Ackmann, Paul W.
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Volume:
8880
Year:
2013
Language:
english
DOI:
10.1117/12.2027843
File:
PDF, 927 KB
english, 2013
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