SPIE Proceedings [SPIE Photomask and NGL Mask Technology XX - Yokohama, Japan (Tuesday 16 April 2013)] Photomask and Next-Generation Lithography Mask Technology XX - Development of optical system on novel Projection Electron Microscopy (PEM) for EUV masks and its basic performance evaluation
Hatakeyama, Masahiro, Murakami, Takeshi, Terao, Kenji, Watanabe, Kenji, Naito, Yoshihiko, Amano, Tsuyoshi, Hirano, Ryoichi, Iida, Susumu, Terasawa, Tsuneo, Watanabe, Hidehiro, Kato, KokoroVolume:
8701
Year:
2013
Language:
english
DOI:
10.1117/12.2030647
File:
PDF, 395 KB
english, 2013