SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Advances in Patterning Materials and Processes XXXIII - Challenges for immersion lithography extension based on negative tone imaging (NTI) process
Hohle, Christoph K., Younkin, Todd R., Shirakawa, Michihiro, Omatsu, Tadashi, Ou, Keiyu, Yonekuta, Yasunori, Hatakeyama, Naoya, Asakawa, Daisuke, Yakushiji, Takashi, Fujita, Mitsuhiro, Muraki, NanaeVolume:
9779
Year:
2016
Language:
english
DOI:
10.1117/12.2218939
File:
PDF, 1.20 MB
english, 2016