SPIE Proceedings [SPIE Photomask Japan 2016 - Yokohama, Japan (Wednesday 6 April 2016)] Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology - Lithographic performance of a new “low-k” mask
Yoshioka, Nobuyuki, Adachi, Takashi, Tani, Ayako, Fujimura, Yukihiro, Hayano, Katsuya, Morikawa, Yasutaka, Miyashita, Hiroyuki, Inazuki, Yukio, Kawai, YoshioVolume:
9984
Year:
2016
Language:
english
DOI:
10.1117/12.2242870
File:
PDF, 1.05 MB
english, 2016