SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Optical Microlithography IX - Improvement of resist pattern fidelity with partial attenuated phase-shift mask
Yasuzato, Tadao, Ishida, Shinji, Kasama, Kunihiko, Fuller, Gene E.Volume:
2726
Year:
1996
Language:
english
DOI:
10.1117/12.240947
File:
PDF, 1.26 MB
english, 1996