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SPIE Proceedings [SPIE Symposium on Photomask and X-Ray Mask Technology - Kawasaki City, Japan (Thursday 18 April 1996)] Photomask and X-Ray Mask Technology III - Defect printability analysis in electron-beam cell projection lithography
Itoh, Katsuyuki, Yamashita, Hiroshi, Ema, Takahiro, Nozue, Hiroshi, Yoshihara, HideoVolume:
2793
Year:
1996
Language:
english
DOI:
10.1117/12.245201
File:
PDF, 451 KB
english, 1996