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SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Optical Microlithography X - Phase shifting and optical proximity corrections to improve CD control on logic devices in manufacturing for sub-0.35-μm i-line
Ackmann, Paul W., Brown, Stuart E., Nistler, John L., Spence, Chris A., Fuller, Gene E.Volume:
3051
Year:
1997
Language:
english
DOI:
10.1117/12.276034
File:
PDF, 962 KB
english, 1997