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SPIE Proceedings [SPIE 18th Annual BACUS Symposium on Photomask Technology and Management - Redwood City, CA (Wednesday 16 September 1998)] 18th Annual BACUS Symposium on Photomask Technology and Management - Evaluation of the practical use of GHOST technique for various e-beam resists
Cha, Byung-Cheol, Kim, Jin-Min, Kim, Byung G., Choi, Seong-Woon, Yoon, Hee-Sun, Sohn, Jung-Min, Grenon, Brian J., Abboud, Frank E.Volume:
3546
Year:
1998
Language:
english
DOI:
10.1117/12.332834
File:
PDF, 530 KB
english, 1998