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SPIE Proceedings [SPIE 18th Annual BACUS Symposium on Photomask Technology and Management - Redwood City, CA (Wednesday 16 September 1998)] 18th Annual BACUS Symposium on Photomask Technology and Management - Method to determine printability of photomask defects and its use in phase-shift mask evaluations
Mansfield, Scott M., Ferguson, Richard A., Liebmann, Lars W., Molless, Antoinette F., Wong, Alfred K. K., Grenon, Brian J., Abboud, Frank E.Volume:
3546
Year:
1998
Language:
english
DOI:
10.1117/12.332867
File:
PDF, 808 KB
english, 1998