SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Advances in Resist Technology and Processing XVI - Optimization of 300-mm coat, exposure, and develop processes for 180-nm and smaller features
Swanson, Walter H., Petersen, John S., Mo, Wang Pen, Heck, Joseph A., Conley, WillVolume:
3678
Year:
1999
Language:
english
DOI:
10.1117/12.350146
File:
PDF, 2.97 MB
english, 1999