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SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Advances in Resist Technology and Processing XVI - Novel e-beam resist with alicyclic olefin moieties for high etch selectivity
Hong, Sung-Eun, Roh, Chi-Hyeong, Jung, Jae Chang, Jung, Min-Ho, Kim, Hyeong-Soo, Baik, Ki-Ho, Conley, WillVolume:
3678
Year:
1999
Language:
english
DOI:
10.1117/12.350243
File:
PDF, 2.86 MB
english, 1999