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SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Metrology, Inspection, and Process Control for Microlithography XIII - Reduction of postdevelop defects and process times for DUV lithography
Krishna, Murthy S., Gurer, Emir, Lee, Ed C., Flores, Gary E., Ooka, Sandra S., Salois, John W., Cherry, Royal, Reynolds, Reese M., Singh, BhanwarVolume:
3677
Year:
1999
Language:
english
DOI:
10.1117/12.350842
File:
PDF, 448 KB
english, 1999