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SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Optical Microlithography XII - Effect of negative-tone mask lithography on lens aberration phenomena
Tsujita, Kouichirou, Yamauchi, Yuuji, Ueno, Atsushi, Wakamiya, Wataru, Nishimura, Tadashi, Van den Hove, LucVolume:
3679
Year:
1999
Language:
english
DOI:
10.1117/12.354350
File:
PDF, 658 KB
english, 1999