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SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Optical Microlithography XII - Application of a new approach to optical proximity correction
Rosenbusch, Anja, Hourd, Andrew C., Juffermans, Casper A. H., Kirsch, Hartmut, Lalanne, Frederic P., Maurer, Wilhelm, Romeo, Carmelo, Ronse, Kurt G., Schiavone, Patrick, Simecek, Michal, Toublan, OlivVolume:
3679
Year:
1999
Language:
english
DOI:
10.1117/12.354378
File:
PDF, 1.94 MB
english, 1999