SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Metrology, Inspection, and Process Control for Microlithography XIV - Metrology issues of reticles with optical proximity correction-assist features using the atomic force microscope
Chao, Kuo-Jen, Plano, Robert J., Kingsley, Jeffrey R., Sullivan, Neal T.Volume:
3998
Year:
2000
Language:
english
DOI:
10.1117/12.386533
File:
PDF, 1.25 MB
english, 2000