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SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Advances in Resist Technology and Processing XVII - Improvement of resist profile roughness in bilayer resist process
Jeong, Chang-Young, Ryu, Sang-Wook, Park, Ki-Yeop, Lee, Won-Kyu, Lee, Seung-Woog, Lee, Dai-Hoon, Houlihan, Francis M.Volume:
3999
Year:
2000
Language:
english
DOI:
10.1117/12.388368
File:
PDF, 2.08 MB
english, 2000