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SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology VII - Kanagawa, Japan (Wednesday 12 April 2000)] Photomask and Next-Generation Lithography Mask Technology VII - Resolution enhancement techniques and mask manufacturability for subwavelength lithography
Karklin, Linard, Lin, Burn J., Morimoto, HiroakiVolume:
4066
Year:
2000
Language:
english
DOI:
10.1117/12.392103
File:
PDF, 877 KB
english, 2000