SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Optical Microlithography XIV - 100-nm gate lithography for double-gate transistors
Krasnoperova, Azalia A., Zhang, Ying, Babich, Inna V., Treichler, John, Yoon, Jung H., Guarini, Kathryn, Solomon, Paul M., Progler, Christopher J.Volume:
4346
Year:
2001
Language:
english
DOI:
10.1117/12.435793
File:
PDF, 1.20 MB
english, 2001
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