SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Advances in Resist Technology and Processing XVIII - Comparison of acid-generating efficiencies in 248 and 193-nm photoresists
Cameron, James F., Chan, Nicholas, Moore, Kathryn, Pohlers, Gerd, Houlihan, Francis M.Volume:
4345
Year:
2001
Language:
english
DOI:
10.1117/12.436838
File:
PDF, 291 KB
english, 2001