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SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Advances in Resist Technology and Processing XVIII - Investigation of electron beam stabilization of 193-nm photoresists
Kim, Myoung-Soo, Park, Jong-Woon, Kim, Hak-Joon, Jun, Bum-Jin, Gil, Myung-Goon, Kim, Bong-Ho, Ross, Matthew F., Livesay, William R., Houlihan, Francis M.Volume:
4345
Year:
2001
Language:
english
DOI:
10.1117/12.436905
File:
PDF, 2.05 MB
english, 2001