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SPIE Proceedings [SPIE Photomask Technology 2002 - Monterey, CA (Tuesday 1 October 2002)] 22nd Annual BACUS Symposium on Photomask Technology - Influence of the baking process for chemically amplified resist on CD performance
Sasaki, Shiho, Ohfuji, Takeshi, Kurihara, Masa-aki, Inomata, Hiroyuki, Jackson, Curt A., Murata, Yoshio, Totsukawa, Daisuke, Tsugama, Naoko, Kitano, Naoki, Hayashi, Naoya, Hwang, David H., Grenon, BriVolume:
4889
Year:
2002
DOI:
10.1117/12.468089
File:
PDF, 813 KB
2002