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SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Metrology, Inspection, and Process Control for Microlithography XVI - Scatterometry: interpretation by different methods of electromagnetic simulation
Machavariani, Vladimir, Garber, Shahar, Cohen, Yoel, Herr, Daniel J. C.Volume:
4689
Year:
2002
Language:
english
DOI:
10.1117/12.473456
File:
PDF, 695 KB
english, 2002